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Optimization of substrate heating during sputtering processes is essential to obtain desired microstructures of deposited thin films, as it provides the required energy flux during the nucleation and growth. In this work, Ge 2 Sb 2 Te 5 thin films were prepared by a pulsed-DC magnetron sputtering process at optimized plasma conditions (pulsed frequency and pulse reversal time). The effect of substrate heating, in temperature range of 250–450 °C, was systematically investigated on the process throughput and various properties i.e. microstructure, morphology, atomic composition, carrier concentration, mobility and Seebeck coefficient of deposited films. The substrate heating was found to be required to obtain films in cubic crystalline phase. Through the optimization of substrate temperature, process throughput and surface properties, electrical properties as well as thermoelectric power factors were enhanced. The maximum power factor value of thin films was achieved as 0.77 mW m –1  K –2 for the substrate temperature as 400 °C. [ABSTRACT FROM AUTHOR]