1. Surface Morphology of Zinc Oxide Thin Films deposited by TCVD.
- Author
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Rafaie, H. A., Noor, F. W. M., Amizam, S., Abdullah, S., and Rusop, M.
- Subjects
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CHEMICAL vapor deposition , *THIN films , *SOLID state electronics , *VAPOR-plating , *SCANNING electron microscopes , *ZINC oxide - Abstract
Surface morphology study of Zinc Oxide (ZnO) thin films by using Thermal Chemical Vapor Deposition (Thermal-CVD) was investigated. The ZnO compound was synthesized from zinc acetate dehydrate which act as a starting material to form the ZnO thin films. It was deposited on as-prepared Nanonstructured Silicon (NSi) with deposition temperature ranging from 400–600° C without catalyst-assisted. The surface morphology of the samples before and after the deposition process was examined by using Analytical Scanning Electron Microscope (SEM). The result shows that the obtained ZnO thin films possess good crystalline structure at deposition temperature of 600° C and the surface morphologies of the ZnO thin films improved greatly with an increase in deposition temperature. XRD was employed to study the evolution of the crystalline orientation using X-Ray Diffractrometer (XRD). [ABSTRACT FROM AUTHOR]
- Published
- 2010
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