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A nonvolatile memory (NVM) based on an amorphous-indium–gallium–zinc oxide (a-IGZO) thin-film transistor (TFT) with defect-engineered gate insulator was demonstrated. The gate insulator was a blocking alumina/storage alumina/tunneling alumina stack structure, which was simply assembled in a single atomic layer deposition step. The memory device showed a positive shift of threshold voltage as large as 14.4 V after +20 V, 1 s programming. In contrast, the memory erasing was not sensitive to negative gate voltage in the dark. Once programmed, the memory can only be light erased. Furthermore, the light combined with a negative bias improved the erasing speed effectively. In addition, a 10-year memory window as large as 7.5 V was extrapolated at room temperature with a charge loss of 34.7%. Based on the observation of blisters in the storage alumina layer after high temperature annealing, Fourier transform infrared spectroscopy measurement and first-principles calculations, the high electron storage capacity can be attributed to the deep defect levels in the storage alumina layer, which were originated from hydrogen impurity. This a-IGZO TFT charge trapping NVM with high performance and simple process is a candidate device for the application of fully functional transparent system on panel. [ABSTRACT FROM AUTHOR]

Hole transport control and carrier injection improvement have been demonstrated in the InGaN/GaN light-emitting diodes (LEDs) with step-stage multiple-quantum-well (MQW) structure and Si-doped hole-blocking barriers. Single-wavelength emission was obtained under electrical pumping in these LEDs by utilizing hole-blocking effect. The light emission around 450 nm showed a substantial increase compared with the reference sample with single or step-stage indium-content MQWs. The droop behavior and wavelength stability were also improved significantly. These improvements were attributed to the enhanced carrier injection to the active region due to the alleviation of the quantum-confined Stark effect and the effective hole-blocking effect of the Si-doped barriers. [ABSTRACT FROM AUTHOR]