1. Study of uniformity of atmospheric pressure plasma microjet array for maskless parallel micropatterned etching.
- Author
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Junfeng Yang, Lingju Xia, Shuneng Zhou, Lirui Liao, Zekun Wang, Li Wen, Yan, K. C., Hai Wang, and Jiaru Chu
- Subjects
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ETCHING , *UNIFORMITY , *ATMOSPHERIC pressure , *GAS flow , *PLASMA etching , *VERY light jets - Abstract
A novel atmospheric pressure plasma microjet (APPμJ) array is proposed to realize maskless parallel micropatterned etching of materials. Due to applying microfabrication technology, the dimension and distance of multiple jets in an array can be adjusted at a micro/nanoscale. However, interactions among multiple jets often lead to inconsistency of microjets and nonuniformity of sample etching. In this study, a 1 × 2 APPμJ array with 90-μm nozzles and varying jet-to-jet distance is developed. The effects of different operating factors on the consistency of the APPμJ array are investigated. The experiment results show that the consistency of the microjet array and uniformity of sample etching can be greatly improved by optimizing operating parameters, such as applied voltage, gas flow rate, and jet-to-jet distance. [ABSTRACT FROM AUTHOR]
- Published
- 2022
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