1. Low temperature plasma carbon nanotubes growth on patterned catalyst
- Author
-
Dubosc, M., Minea, T., Besland, M.P., Cardinaud, C., Granier, A., Gohier, A., Point, S., and Torres, J.
- Subjects
- *
CHEMICAL vapor deposition , *NANOTUBES , *FULLERENES , *LIGHTING - Abstract
Abstract: This paper reports on carbon nanotubes (CNT) arrays grown on patterned catalysts by plasma-enhanced chemical vapor deposition (PECVD). CNT growth has been performed by low pressure high-density plasma process at 700°C in acetylene/ammonia mixture. Prior to CNT growth, a standard lift-off process has been used for catalyst patterning. The chemical impact of the lift-off sequence on the catalyst activity is discussed with respect to the amount of Ni pre-deposited. In particular, it discusses the impact of this wet treatment on CNT growth when the catalyst amount is lower than a threshold value. [Copyright &y& Elsevier]
- Published
- 2006
- Full Text
- View/download PDF