1. Tribological and mechanical behaviors of TiN/CN x multilayer films deposited by magnetron sputtering
- Author
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Liu, D.G., Tu, J.P., Gu, C.D., Chen, R., and Hong, C.F.
- Subjects
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TITANIUM nitride , *MULTILAYERED thin films , *MAGNETRON sputtering , *TRIBOLOGY , *X-ray diffraction , *HARDNESS , *MECHANICAL properties of thin films , *EPITAXY - Abstract
Abstract: TiN/CN x multilayer films with bilayer periods of 4.5–40.3nm were deposited by direct-current magnetron sputtering. Layer morphology and structure of the multilayered films were characterized by X-ray diffraction, X-ray photoelectron spectroscopy, scanning electron microscopy and transmission electron microscopy. The TiN/CN x multilayers exhibited coherent epitaxial growth due to the mutual growth-promoting effect at small bilayer period and some crystalline regions going through the interface of TiN/CN x . Nanoindentation tests showed that the hardness of the multilayers varied from 12.5 to 31GPa, with the highest hardness being obtained with a bilayer period of 4.5nm. The tribological properties of the films were investigated using a ball-on-disk tribometer in humid air, and the TiN/CN x multilayer with a bilayer period of 4.5nm also exhibited the lowest friction coefficient and the highest wear resistance. [Copyright &y& Elsevier]
- Published
- 2011
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