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Structural integrity and robustness are key parameters to evaluate microfabrication techniques. Bending and collapsing of 2D/3D microstructures are commonly noted in solvent-involved procedures, e.g., liquid-based post-treatment in wet-etching, lithography, and Two Photon Polymerizations (TPPs). Such structural failures are caused by excessive solution-imposed capillary forces, where multiple kinds of liquids may intensively participate. Current pieces of the literature focus on the mechanical one-axis models to illustrate their deformation process. To date, there exists an emerging demand for dual-axis models to satisfy rapidly developed micro/nano-engineerings. Here, utilizing polymer micro-pillars distributed in a square array as an illustration example, a dual-axis beam-sway model is proposed considering the influences of structure arrangement as well as the solvent. Specifically, a simplified criterion for judging structural stability is identified. For verifications, the TPP-based experimental data show excellent consistency with model predictions. All in all, the extended model offers reliable guidance for the fabrication of delicate structures and further benefits the optimization of related microfabrication processes. [ABSTRACT FROM AUTHOR]