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1. Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology

Author

Saburo Nonogaki, Ueno Takumi, Toshio Ito, Saburo Nonogaki, Ueno Takumi, and Toshio Ito

Subjects
Semiconductors--Design and construction, Microlithography--Industrial applications, Manufacturing processes, Photoresists
Abstract

'Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials.'

Published
1998

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